Next Generation Electronics
With Active Devices

in Three Dimensions

Next Generation Electronics With Active Devices

in Three Dimensions

ALPIN Workshop on Atomic Layer Processes

17.09.2026 (Thursday) - 18.09.2026 (Friday) , 09:00 - 09:00
Leibniz IFW , Helmholtzstraße 20 , 01069 Dresden

To celebrate the fifth anniversary of our annual ALPIN workshop, it will return to Dresden this September. Please save the date and come to Dresden on September 17th and 18th.

All infos & registration: https://alpin-germany.de/veranstaltungen/alpin-workshop-2026-in-dresden/

Location: Leibniz Institute for Solid State and Materials Research (IFW) Dresden, Germany

This two-day workshop will feature four thematic sessions, each including an invited keynote lecture and several short presentations based on selected posters. The program is designed to foster in-depth discussions and exchange of ideas across the atomic layer deposition (ALD) and etching (ALE) community. As a key part of the workshop, every participant is invited to present their current research or dissertation topic via a poster – a great opportunity to showcase your work and engage with peers.

Highlights of the event:
•    Invited talks by leading experts in atomic layer processes
•    Poster presentations with short pitch talks (please indicate your interest during registration)
•    Sponsored evening event on the first day: a scenic boat tour on the Elbe River with food and drinks
•    Optional hike in Saxon Switzerland on Saturday, September 19, 2026

Organizing Team: Anjana Devi, Harish Parala, Kornelius Nielsch, Amin Bahrami, Sebastian Lehmann (Leibniz IFW Dresden), and Martin Knaut (TU Dresden)

Important note: Participation is limited to 150 attendees, so early registration is strongly encouraged.

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